CYKY diamond Single Side Lapping/Polishing machines SSP-50DPAW feature rotary models with sophisticated control systems. This model is capable of executing complex lapping and polishing routines process while producing precise and repeatable results with a special auto-facing unit to control plate performance

CYKY diamond Single Side Lapping/Polishing machines SSP-50DPAW feature rotary models with sophisticated control systems. This model is capable of executing complex lapping and polishing routines process while producing precise and repeatable results with a special auto-facing unit to control plate performance.

• Sapphire Substrate / Wafer
• Semiconductor Wafer
• Tungsten Carbide Parts
• Ceramic Parts
• Valves
• Crystal Glass
• Oscillator Parts
Items  | SSP-36DPAW  | SSP-50DPAW  | |||
Polishing plate  | Plate material  | Oxygen free Cu , Resin-Cu  | Oxygen free Cu  | ||
Or Tin plate (*option)  | or Tin plate(*option)  | ||||
Plate size  | Φ910mm  | Φ1240mm  | |||
Revolution control  | By inverter.  | Home position.  | |||
Plate cooling  | Cooling water jacket  | Cooling water jacket  | |||
Pressure plate  | P. Plate  | 4 axles.  | 4 axles.  | ||
Block size  | 360mmΦ  | 485mmΦ  | |||
Applied pressure  | By cylinder  | By cylinder  | |||
Work block  | -  | Auto Centering  | |||
Facing unit  | Mounting type.  | Square type.  | |||
Capacity / batch  | 4 inch wafer x 24 Pcs  | 4 inch wafer x 40 Pcs  | |||
6 inch wafer x 12 Pcs  | 6 inch wafer x 24 Pcs  | ||||
Utility  | Electricity  | AC220V, 3Phase, 60Hz  | AC220V, 3Phase, 60Hz  | ||
Pneumatic  | 0.5~0.8 Mpa  | 0.5~0.8 Mpa  | |||
Etc  | Machine Size  | 1350 *2250 *1920 mm  | 1640 *3029 *2575 mm  | ||
Machine Weight  | 3,500Kg.  | 5,500Kg.  | |||
Controller  | Touch Screen (Proface)  | Touch Screen (Proface)  | |||
Signal lamp with alarm  | |||||
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